Keywords: EUV lithography

In April 2025, an R&D project for innovative fundamental technologies considered essential for the further development of next-generation semiconductor technologies has been launched, bringing together institutions and human resources with cutting-edge technologies related to EUV lithography (the overall principal investigator is Katsumi Midorikawa, special advisor to RIKEN). The research topics will mainly be the development of new lasers, mirrors for EUV, and laser microfabrication technology for back-end processing. In this project, Tomita will be responsible for the development of measurement and optimization techniques for the plasma for EUV light sources generated by the laser.