Applied Quantum Science and Engineering
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Research and Development of Core Technologies for Next-Generation Semiconductor Microfabrication
In April 2025, an R&D project for innovative fundamental technologies considered essential for the further development of next-generation semiconductor technologies has been launched, bringing together institutions and human resources with cutting-edge technologies related to EUV lithography (the overall principal investigator is Katsumi Midorikawa, special advisor to RIKEN). The research topics will mainly be the development of new lasers, mirrors for EUV, and laser microfabrication technology for back-end processing. In this project, Tomita will be responsible for the development of measurement and optimization techniques for the plasma for EUV light sources generated by the laser.
Kentaro Tomita, and Katsumi Midorikawa
Key and Advanced Technology R&D through Cross Community (Collaboration Program) 2025.4.1～2027.3.31
Development of dimension reduction scheme for data assimilation using criticality experiments
The nuclear cross section uncertainty given as a covariance matrix will be used to evaluate the realistic range of important parameters in the safety analysis of nuclear reactors. In recent discussions, the application of data assimilation is considered important to incorporate criticality experiment findings. However, there is a practical issue to treat the covariance matrix after applying data assimilation because the covariance matrix becomes much denser one by causing complex correlated components and the computational cost becomes increased. This research project develops a dimension reduction scheme to solve this practical issue.
Principal investigator: Tatsuya Fujita, and Collaborator: Go Chiba
Grant-in-Aid for Scientific Research(C) 2025.4.1～2029.3.31